Table 1
Different samples of our two haze analogs.
| Gas composition | Substrate | Production(a) (h) | Film thickness(b) (nm) | Film thickness uncertainty(c) |
|---|---|---|---|---|
| 95% N2/4% CH4/1% CO2 | MgF2 | 8 | 1375 | ≤1% |
| (reduced analog) | doped Si | 8 | 1566 | ≤1% |
| intrinsic Si | 8 | 1445 | ≤3% | |
| 95% N2/2% CH4/3% CO2 | MgF2 | 57 | 750 | ≤3% |
| (oxidized analog(d)) | intrinsic Si | 57 | 855 | ≤3% |
Notes. (a)The production refers to the duration of the experiment. (b)The film thickness are measured with the Swanepoel method or with UV–Vis ellipsometry depending on the sample (see main text). (c)The uncertainty on the film thickness is determined using 6–7 measurements at different positions on the samples. (d)As only spectroscopic measurements were performed on the oxidized analog, the doped Si substrate was not used.
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