Fig. 4
Simulated spectra at 300 K for SiO (oscillator data from Table 1) and SiO2 (oscillator data from Wetzel 2012) compared to the measurement of a SiO film that was annealed at 873 K. The spectra are shifted against each other, and the dashed lines indicate the oscillator position of the Si stretching mode of SiO and SiO2, respectively.
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