Volume 372, Number 3, June IV 2001
|Page(s)||1064 - 1070|
|Published online||15 June 2001|
The Si(PJ) + O reaction: A fast source of SiO at very low temperature; CRESU measurements and interstellar consequences
UMR 6627: Physique des Atomes, Lasers, Molécules et Surfaces, Équipe Astrochimie Expérimentale, Université de Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
2 Observatoire de Paris, 92195 Meudon Principal Cedex, France e-mail: Guillaume.PineauDesForets@obspm.fr
Corresponding author: A. Canosa, email@example.com
Accepted: 23 March 2001
The rate coefficient of the reaction Si(3PJ) + O2 SiO + O has been measured at temperatures down to 15 K using a CRESU (Cinétique de Réaction en Écoulement Supersonique Uniforme) apparatus coupled with the PLP-LIF (Pulsed Laser Photolysis -Laser Induced Fluorescence) technique. The temperature dependence of the rate coefficient is well fitted using the expression: (T/300 K)-0.53 cm3 molecule-1 s-1 in the temperature range 15-300 K. The silicon chemistry in interstellar clouds is reviewed and possible consequences of our study are stressed.
Key words: molecular processes / methods: laboratory / ISM: molecules
© ESO, 2001
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