| Issue |
A&A
Volume 372, Number 3, June IV 2001
|
|
|---|---|---|
| Page(s) | 1064 - 1070 | |
| Section | Astronomical instrumentation | |
| DOI | https://doi.org/10.1051/0004-6361:20010542 | |
| Published online | 15 June 2001 | |
The Si(
PJ) + O
reaction: A fast source of SiO at very low
temperature; CRESU measurements and interstellar consequences
1
UMR 6627: Physique des Atomes, Lasers, Molécules et Surfaces, Équipe Astrochimie Expérimentale, Université de Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
2
Observatoire de Paris, 92195 Meudon Principal Cedex, France e-mail: Guillaume.PineauDesForets@obspm.fr
Corresponding author: A. Canosa, andre.canosa@univ-rennes1.fr
Received:
8
March
2001
Accepted:
23
March
2001
The rate coefficient of the reaction Si(3PJ) + O2
SiO + O
has been measured at temperatures down to 15 K using a CRESU (Cinétique de Réaction en
Écoulement Supersonique Uniforme) apparatus coupled with the PLP-LIF (Pulsed Laser Photolysis
-Laser Induced Fluorescence) technique. The temperature dependence of the rate coefficient
is well fitted using the expression: 
(T/300 K)-0.53
cm3 molecule-1 s-1 in the temperature range
15-300 K. The silicon chemistry in interstellar clouds is reviewed and possible
consequences of our study are stressed.
Key words: molecular processes / methods: laboratory / ISM: molecules
© ESO, 2001
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