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Fig. 6


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Image of a diverging beam, sampled by an MLA, imaged at a distance of approximately 30 mm from the focal plane. Only the central microlens has a secondary microlens placed behind it that reimages the micropupil that forms behind each microlens on the camera. Left panel: interference pattern that is visible in most subfields is absent in the reimaged micropupil in the center. Right panel: as in the left panel, but with the right half of the MLA masked. The images of the partially masked microlenses clearly show the mask, but on the left side, consistent with the point reflection that is intrinsic to an image formed by a pinhole. In contrast, the image produced by the secondary microlens is only slightly affected.

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