Scatter plot thickness versus current density for SIM 2D at t_{eddy − turnover2D} to show the differences between the two methods in estimating the thickness. The current density was computed at the center of each current structure. By “mask method”, we mean the method to find thickness explained in Section 4.1, which uses the maximum distance between points satisfying J ≥ J_th. On the contrary, by “FWHM method”, we refer to the alternative method explained in Appendix A which computes the thickness using full width at half maximum of the interpolated profile of J. In the sub-panel we show a schematic representation to explain the difference in estimations between the “FWHM method” and the “mask method”.