SICAL- ICP is a setup allowing plasma-induced chemical vapor deposition. It is comprised of a glass tube in which an inductively coupled plasma (ICP) on a continuum hydrocarbon gas flow is maintained by an R.F. source. The plasma envelopes the sample holder placed near the matching box.
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.