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Table 2
Performance of the MCMC technique when applied to isothermal plasmas, and to multithermal plasmas composed of two different isothermal components.
W = 0.01 | W = 0.02 | W = 0.05 | W = 0.1 | |
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Isothermal plasma – no random error | ||||
χ2 | 0.013 | 0.037 | 0.0018 | 0.00063 |
Spurious comp. | Y | N | N | N |
Single peak | N | N | Y | Y |
Noise | Y | N | N | N |
EM(T) width | 0.03 | 0.04 | 0.05 | 0.10 |
log T1 | 5.99 − 6.03 | 5.98 − 6.02 | 6.00 | 6.00 |
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Multithermal plasma – no random error | ||||
Δlog T = 0.10 | ||||
χ2 | 0.0062 | 0.0085 | 0.0058 | 0.0069 |
Spurious comp. | Y | N | N | N |
Two peaks | N | N | Y | Y |
Noise | Y | Y | N | N |
EM(T) width | 0.03 | 0.06 | 0.05 | 0.10 |
log T1 | 5.99 − 6.02 | 5.98 − 6.04 | 6.00 | 6.00 |
log T2 | 6.10 − 6.11 | 6.10 | 6.10 | 6.10 |
Δlog T = 0.15 | ||||
χ2 | 0.0013 | 0.0035 | 0.00087 | 0.23 |
Spurious comp. | Y | Y | N | N |
Two peaks | N | N | Y | Y |
Noise | Y | Y | N | N |
EM(T) width | 0.03 | 0.06 | 0.05 | 0.20 |
log T1 | 5.99 − 6.02 | 5.98 − 6.04 | 6.00 | 6.00 − 6.20 |
log T2 | 6.15 | 6.14 − 6.16 | 6.15 | 6.00 − 6.20 |
Δlog T = 0.20 | ||||
χ2 | 0.0053 | 0.0078 | 0.0017 | 0.00055 |
Spurious comp. | Y | N | N | N |
Two peaks | N | N | Y | Y |
Noise | Y | Y | N | N |
EM(T) width | 0.04 | 0.04 | 0.05 | 0.10 |
log T1 | 5.99 − 6.02 | 5.98 − 6.02 | 6.00 | 6.00 |
log T2 | 6.18 − 6.22 | 6.18 − 6.22 | 6.20 | 6.20 |
Notes. See Sect. 2.7 for details.
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