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Table 2

Performance of the MCMC technique when applied to isothermal plasmas, and to multithermal plasmas composed of two different isothermal components.

W = 0.01 W = 0.02 W = 0.05 W = 0.1

Isothermal plasma – no random error
χ2 0.013 0.037 0.0018 0.00063
Spurious comp. Y N N N
Single peak N N Y Y
Noise Y N N N
EM(T) width 0.03 0.04 0.05 0.10
log T1 5.99 − 6.03 5.98 − 6.02 6.00 6.00

Multithermal plasma – no random error
Δlog T = 0.10
χ2 0.0062 0.0085 0.0058 0.0069
Spurious comp. Y N N N
Two peaks N N Y Y
Noise Y Y N N
EM(T) width 0.03 0.06 0.05 0.10
log T1 5.99 − 6.02 5.98 − 6.04 6.00 6.00
log T2 6.10 − 6.11 6.10 6.10 6.10
Δlog T = 0.15
χ2 0.0013 0.0035 0.00087 0.23
Spurious comp. Y Y N N
Two peaks N N Y Y
Noise Y Y N N
EM(T) width 0.03 0.06 0.05 0.20
log T1 5.99 − 6.02 5.98 − 6.04 6.00 6.00 − 6.20
log T2 6.15 6.14 − 6.16 6.15 6.00 − 6.20
Δlog T = 0.20
χ2 0.0053 0.0078 0.0017 0.00055
Spurious comp. Y N N N
Two peaks N N Y Y
Noise Y Y N N
EM(T) width 0.04 0.04 0.05 0.10
log T1 5.99 − 6.02 5.98 − 6.02 6.00 6.00
log T2 6.18 − 6.22 6.18 − 6.22 6.20 6.20

Notes. See Sect. 2.7 for details.

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