Table 15.

SIS detector specifications and performance.

SSD
 Type Silicon ion implant
 Supplier Micron Semiconductor Ltd
 Active area 15.2 cm2 (44.0 mm dia)
 Thickness 700 ± 50 μm
 Mounting substrate Alumina
 Active surface metallization 0
 Junction dead layer 0.05 μm
 Capacitance ∼225 pF
 Depletion voltage ∼100V (Not to exceed 200V)
 Leakage current 3 mA max at +55C
 60 nA typical at +20C
 Alpha width FWHM 35 keV

MCP
 Type Chevron
 Supplier PHOTONICS USA, Inc.
 Outside (Active) Diameter 50.04 (40.00) mm
 Thickness 1.50 ± 0.03 mm
 Electrode material Nichrome (80/20)
 Pore size 25 μm
 Bias Angle 12 ± 1°
 Gain 1 × 107 minimum
 Bias Current Range 5–20 μA
 Resistance 120–480 MΩ

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.