A schematic view of the helium distribution over the star surface is shown in Fig. 3.
The data have been taken from the paper of Kuschnig et al. (1999). Helium is concentrated weaker in the region of the negative compact maximum than in the region of the wide positive maximum. The thin line marks the region where the change of the magnetic field polarity takes place. It is seen from Fig. 4 that a helium spot of small size is located near the negative field maximum. The helium distribution is consistent with the assumption that it is concentrated in the regions with vertical magnetic field lines of force. However, it is not clear why helium has a weaker concentration in the region with the higher field intensity.
The data presented by Vauclair et al. (1979) suggest that the
helium anomaly formation is strongly dependent on the helium
diffusion flow
(denotation see Vauclair). If this
flow is larger than a certain critical range of the flow value
,
then a normal helium abundance is observed; if
the flux is smaller, then the abundance is decreased. The faint
helium spot at the negative pole implies that the flow value is
either at the upper or at the lower boundary of the range
.
Taking into account that the mass loss at the
negative strong pole is more likely to be greater than at the
positive pole, it can be assumed that the helium diffusion flow is
too strong there.
Figure 4 presents schematically the regions of the Si concentration derived by different authors (A - Goncharskij et al. 1983; B - Kuschnig et al. 1999; C - Hatzes et al. 1997) and the region of maximum field strength (thin line).
At first sight, the Si distribution of different authors differs remarkably, however, one common property is noticeable: silicon is concentrated predominantly around the negative pole. In the region of the weaker positive field, the silicon abundance is lower than normal. Alecian & Vauclair (1981) and also Megessier (1984) discuss the importance of the horizontal field component for the diffusion of chemical elements in CP stars, silicon in particular. The calculation shows that in the case of the displaced dipole model, the horizontal magnetic field component has a maximum in a ring inside the marked circle. For this reason the conclusion of Hatzes (1997), that silicon in CU Vir is concentrated in the region, where the lines of force are mainly horizontal, is correct in first approximation. This inference, however, is contradicting to the absence of any silicon overabundance near the pole, where the lines of force are vertical.
It is seen in the diagrams that the existing techniques are
capable of providing the distribution of chemical elements only on
the visible area of the surface. From considerations of symmetry
the derived map is more likely to describe the invisible
hemisphere. When assuming that the chemical elements are, indeed,
related to the magnetic field, one can imagine that the regions
occupied by silicon (after Hatzes) should be transferred in the
diagrams to the lower hemisphere symmetrically to the dipole plane
(the plane, in which the CU Vir dipole is located, is practically
coincident with the equatorial plane).
Thus the silicon regions
will occupy all the space inside the area (bound by the thin line
in Fig. 1A).
It is very interesting that - after the papers of all other
authors - the silicon spot is divided into two ones. The
difficulty of the assumptions made is that one of the silicon
spots is outside the supposed region with horizontal orientation
of the lines of force. If silicon is actually concentrated in the
regions with the horizontal lines of force, then the magnetic
"spot" can be assumed to have a complex structure. Modelling
cannot reveal such a complex structure because of the insufficient
number of measurements of .
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Figure 4:
The schematic view of the silicon distribution over
the CU Vir surface (designation the same as in Fig. 3)
A) data from Hatzes (1997), B) data from Kuschnig et al. (1997), C) data from Goncharskij et al. (1983). |
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