Volume 372, Number 3, June IV 2001
|Page(s)||1064 - 1070|
|Published online||15 June 2001|
The Si(PJ) + O reaction: A fast source of SiO at very low temperature; CRESU measurements and interstellar consequences
UMR 6627: Physique des Atomes, Lasers, Molécules et Surfaces, Équipe Astrochimie Expérimentale, Université de Rennes I, Campus de Beaulieu, 35042 Rennes Cedex, France
2 Observatoire de Paris, 92195 Meudon Principal Cedex, France e-mail: Guillaume.PineauDesForets@obspm.fr
Corresponding author: A. Canosa, firstname.lastname@example.org
Accepted: 23 March 2001
The rate coefficient of the reaction Si(3PJ) + O2 SiO + O has been measured at temperatures down to 15 K using a CRESU (Cinétique de Réaction en Écoulement Supersonique Uniforme) apparatus coupled with the PLP-LIF (Pulsed Laser Photolysis -Laser Induced Fluorescence) technique. The temperature dependence of the rate coefficient is well fitted using the expression: (T/300 K)-0.53 cm3 molecule-1 s-1 in the temperature range 15-300 K. The silicon chemistry in interstellar clouds is reviewed and possible consequences of our study are stressed.
Key words: molecular processes / methods: laboratory / ISM: molecules
© ESO, 2001
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.